Ultrahigh-molecular-weight Polyethylene Porous Film SUNMAP™
Porous film offers air permeability without changing the characteristics of ultrahigh-molecular-weight polyethylene.
"SUNMAP™" is an ultrahigh-molecular-weight polyethylene porous film developed by Nitto Denko's original technology of special calcinations in which ultrahigh-molecular-weight polyethylene powder is formed into a porous sintered compact, then cut. The porous film provides new characteristics such as air permeability and low friction coefficient while maintaining the superior characteristics of ultrahigh-molecular-weight polyethylene such as chemical resistance, abrasion resistance, and releasability. With excellent processability, it offers and will expand a wide range of applications.
Features
- Porous film of open cell with excellent air permeability and moisture permeability.
- Offers superior sliding property by making ultrahigh-molecular-weight polyethylene porous which has excellent abrasion resistance and low friction coefficient.
- Hardly affected by virtually all the chemicals including acid and alkali with its chemical stability.
- Can be used for heat sealing, punching and for fillers with its excellent processability.
Properties
Product No. | SUNMAP LC-T |
Thickness [mm] | 0.5 |
Average pore size [µm] | 17 |
Air permeability [sec/100cm3] | 1.4 |
Porosity [%] | 30 |
Tensile strength [Mpa] | 12 |
Elongation [%] | 90 |
Hardness [Shore D] | 48 |
Surface roughness(Ra) [µm] | 2.0 |
Dynamic coefficient of friction | 0.1 |
[Remarks]
- * The above values are sample observed values, not the guaranteed performance.
Applications
- Absorption/fixing of ceramic green sheet.
- Fixing when cutting LCD panel, cutting glass/ceramic substrates
- Fixing during FPC board screen printing
- Fixing during semiconductor wafer dicing
- For polishing and fixing lenses